ZHAO, C.; DING, Z.; ZHANG, K.; DU, Z.; FANG, H.; CHEN, L.; JIANG, H.; WANG, M.; WU, M. Comprehensive Chlorine Suppression: Advances in Materials and System Technologies for Direct Seawater Electrolysis. Nano-Micro Letters, [S. l.], v. 17, p. 113, 2025. DOI: 10.1007/s40820-025-01653-z. Disponível em: https://nmlett.org/index.php/nml/article/view/1896. Acesso em: 30 jan. 2025.