LI, J.; GUO, Y.; WANG, K.; HUANG, W.; SU, H.; LI, W.; ZHOU, X.; ZHANG, Y.; GUO, T.; WU, C. Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography. Nano-Micro Letters, [S. l.], v. 17, p. 228, 2025. DOI: 10.1007/s40820-025-01737-w. Disponível em: https://nmlett.org/index.php/nml/article/view/2013. Acesso em: 24 apr. 2025.