Issue

Vol. 18 (2026)

Ion Compensation-Assisted Photolithography Enables High-Resolution Electrolytes for Neuromorphic Transistors

https://doi.org/10.1007/s40820-026-02288-4
Wenjing Zhang
State Key Laboratory of Optoelectronic Materials and Technologies and Guangdong Province Key Laboratory of Display Material and Technology, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou 510275, People’s Republic of China
Xiaoci Liang
State Key Laboratory of Optoelectronic Materials and Technologies and Guangdong Province Key Laboratory of Display Material and Technology, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou 510275, People’s Republic of China
Sixing Chen
State Key Laboratory of Optoelectronic Materials and Technologies and Guangdong Province Key Laboratory of Display Material and Technology, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou 510275, People’s Republic of China
Xiuquan Ma
Guangdong Provincial Key Laboratory of Digital Manufacturing Equipment, Guangdong HUST Industrial Technology Research Institute, Dongguan 523000, People’s Republic of China
Chen Chen
Science and Technology on Advanced Ceramic Fibers and Composites Laboratory, College of Aerospace Science and Engineering, National University of Defense Technology, Changsha 410073, People’s Republic of China
Songjia Han
College of Artificial Intelligence and Low‑Altitude Technology, South China Agricultural University, Guangzhou 510642, People’s Republic of China
Chuan Liu
State Key Laboratory of Optoelectronic Materials and Technologies and Guangdong Province Key Laboratory of Display Material and Technology, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou 510275, People’s Republic of China

Corresponding Author: Chuan Liu

liuchuan5@mail.sysu.edu.cn

Nano-Micro Letters, Vol. 18 (2026), Article Number: 434

Abstract

High-density organic electrochemical transistor (OECT) arrays are essential for neuromorphic computing and bioelectronic interfaces, but progress has been limited by the low resolution of electrolyte patterning. Although conventional photolithography offers high feature resolution, it involves a fundamental trade-off among spatial resolution, ionic capacitance, and stability in the electrolyte. Here we report an ion compensation-assisted photolithography (ICAP) strategy that yields electrolyte micro-patterns combining high precision, high capacitance and high stability. A molecularly engineered electrolyte forms, under UV exposure, a physicochemical dual cross-linked network with strong solvent resistance and hydrophobicity, which suppresses swelling during both aqueous development and the subsequent ion-compensation step, preserving pattern fidelity. Ion compensation then restores and enhances the mobile-ion content, increasing areal capacitance. The resulting electrolytes achieve a record 2 μm resolution, 15.6 μF cm−2 capacitance, and strong thermal stability from − 50 to 200 °C. Integrated into OECTs, the ICAP-patterned electrolytes suppress crosstalk by 97.6% and boost on/off ratios by 325%, reducing parasitic coupling by more than 40 times compared to unpatterned arrays. The method is compatible with p-type and n-type organic semiconductors and inorganic oxides, providing a versatile route to scalable neuromorphic circuits and advanced bioelectronics.


Highlights:
1 Ion compensation–assisted photolithography (ICAP) combines UV-triggered dual crosslinking with a post-patterning ion replenishment step, enabling patterned electrolytes with a spatial resolution of 2 μm, a capacitance of 15.6 μF cm−2.
2 ICAP-patterned electrolytes provide array-level ionic isolation by spatially confining ion transport, suppressing lateral ionic leakage and inter-device crosstalk in organic electrochemical transistor arrays.
3 ICAP process is broadly compatible with p-type PEDOT:PSS, n-type benzimidazo-benzophenanthroline, and inorganic WO3, establishing a versatile electrolyte-patterning strategy for high-density electrolyte-gated devices.

Keywords

Organic electrochemical transistors Photolithography Electrolyte Synaptic transistor
Zhang, Wenjing, Xiaoci Liang, Sixing Chen, Xiuquan Ma, Chen Chen, Songjia Han, and Chuan Liu. 2026. “Ion Compensation-Assisted Photolithography Enables High-Resolution Electrolytes for Neuromorphic Transistors”. Nano-Micro Letters 18 (July):434. https://doi.org/10.1007/s40820-026-02288-4.
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