Issue

Vol. 5 No. 1 (2013)

Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching

https://doi.org/10.1007/BF03353725
Zhibo Ma
Key Laboratory of Micro/Nano Systems for Aerospace, Ministry of Education, Northwestern Polytechnical University, Xi’an, 710072, China
Chengyu Jiang
Key Laboratory of Micro/Nano Systems for Aerospace, Ministry of Education, Northwestern Polytechnical University, Xi’an, 710072, China
Weizheng Yuan
Key Laboratory of Micro/Nano Systems for Aerospace, Ministry of Education, Northwestern Polytechnical University, Xi’an, 710072, China
Yang He
Key Laboratory of Micro/Nano Systems for Aerospace, Ministry of Education, Northwestern Polytechnical University, Xi’an, 710072, China

Corresponding Author: Chengyu Jiang

zbma@nwpu.edu.cn

Nano-Micro Letters, Vol. 5 No. 1 (2013), Article Number: 7-12

Abstract

We describe a simple but efficient technique to fabricate large-scale arrays of highly ordered silicon nanostructures. By coupling dual lithography using light of 351.1 nm wavelength with deep reactive ion etching (DRIE), silicon nanostructures of excellent regularity and uniform coverage were achieved. The proposed nanofabrication method not only simplified the nanofabrication process but also produced high-aspect-ratio (higher than 15) nanostructures. The scalloping problem was also controlled by regulating DRIE parameters. The process is rapid, cheap, examined to optimize the fabrication process, and has the potential to be scaled up to large areas. The contact angle of a water droplet atop the surface is larger than 15°. Moreover, by coupling black silicon process with DRIE-based microfabrication, three-dimensional nano/nano dual-scale structures which show robust and stable hydrophobicity have been achieved. This process opens new application possibilities in optical, photoelectric, microelectronic, catalytic and biomedical applications.

Keywords

Hydrophobic Nanostructure arrays DRIE High-aspect-ratio
Ma, Zhibo, Chengyu Jiang, Weizheng Yuan, and Yang He. 2013. “Large-Scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching”. Nano-Micro Letters 5 (1):7-12. https://doi.org/10.1007/BF03353725.
Download Citation
Endnote/Zotero/Mendeley (RIS)
BibTeX
References
  1. G. Gronniger, B. Barwick and H. Batelaana, “Electron diffraction from free-standing, metal-coated transmission gratings”, Appl. Phys. Lett. 87, 124104–124106 (2005). http://dx.doi.org/10.1063/1.2053347
  2. A. D. Ormonde, E. C. Hicks, J. Castillo and R. P. V. Duyne, “Nanosphere lithography: Fabrication of large-area Ag nanoparticle arrays by convective self-assembly and their characterization by scanning UV-visible extinction spectroscopy”, Langmuir 201(16), 6927–6931 (2004). http://dx.doi.org/10.1021/la0494674
  3. Y. C. Chan, Y. K. Lee and Y. Zohar, “High-throughput design and fabrication of an integrated microsystem with high aspect-ratio sub-micron pillar arrays for free-solution micro capillary electrophoresis”, J. Micromech. Microeng. 16(4), 699–707 (2006). http://dx.doi.org/10.1088/0960-1317/16/4/005
  4. J. Taniguchi, K. Koga, Y. Kogo and I. Miyamoto, “Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography”, Microelectron. Eng. 83(4–9), 940–943 (2006). http://dx.doi.org/10.1016/j.mee.2006.01.101
  5. L. J. Guo, “Nanoimprint lithography: Methods and material requirements”, Adv. Mater. 19(4), 495–513 (2007). http://dx.doi.org/10.1002/adma.200600882
  6. G. Sun, T. Gao, X. Zhao and H. Zhang, “Fabrication of micro/nano dual-scale structures by improved deep reactive ion etching”, J. Micromech. Microeng. 20(7), 075028 (2010). http://dx.doi.org/10.1088/0960-1317/20/7/075028
  7. T. M. Bloomstein, M. F. Marchant, S. Deneault, D. E. Hardy and M. Rothschild, “22-nm immersion inter-ference lithography”, Opt. Express 14(14), 6434–6443 (2006). http://dx.doi.org/10.1364/OE.14.006434
  8. H. H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina and S. O. Kim, “Sub-50 nm period patterns with EUV interference lithography” Microelectron. Eng. 67-87, 56–62 (2003). http://dx.doi.org/10.1016/S0167-9317(03)00059-5
  9. C. L. Haynes and R. P. Van Duyne, “Nanosphere lithography: A versatile nanofabrication tool for studies of size-dependent nanoparticle optics”, J. Phys. Chem. B 105(24), 5599–5611 (2001). http://dx.doi.org/10.1021/jp010657m
  10. C. L. Cheung, R. J. Nikolić, C. E. Reinhardt and T. F. Wang, “Fabrication of nanopillars by nanosphere lithography”, Nanotechnology 17(5), 1339–1343 (2006). http://dx.doi.org/10.1088/0957-4484/17/5/028
  11. A. V. Whitney, B. D. Myers and R. P. Van Duyne, “Sub-100 nm triangular nanopores fabricated with the reactive ion etching variant of nanosphere lithography and angle-resolved nanosphere lithography”, Nano Lett. 4(8), 1507–1511 (2004). http://dx.doi.org/10.1021/nl049345w
  12. N. Nagy, E. A. Pap, E. Horv’ath, J. Volk, I. B’arsony, A. De’ak and Z. H’orvolgyi, “Large area self-assembled masking for photonic applications”, Appl. Phys. Lett. 89(6), 063104–063106 (2006). http://dx.doi.org/10.1063/1.2335668
  13. A. Sinitskii, S. Neumeier, J. Nelles, M. Fischer and U. Simon, “Ordered arrays of silicon pillars with controlled height and aspect ratio” Nanotechnology 18(30), 305307 (2007). http://dx.doi.org/10.1088/0957-4484/18/30/305307
  14. C. T. Black, K. W. Guarini, K. R. Milkove, S. M. Baker, T. P. Russell and M. T. Tuominen, “Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication”, Appl. Phys. Lett. 79(3), 409–411 (2001). http://dx.doi.org/10.1063/1.1383805
  15. B. J. Y. Tan, C. H. Sow, T. S. Koh, K. C. Chin, A. T. S. Wee and C. K. Ong, “Fabrication of size-tunable gold nanoparticles array with nanosphere lithography, reactive ion etching, and thermal annealing”, J. Phys. Chem. B 109(22), 11100–11109 (2005). http://dx.doi.org/10.1021/jp045172n
  16. S. S. Mark, M. Bergkvist, P. Bhatnagar, C. Welch, A. L. Goodyear, X. Yang, E. R. Angert and C. A. Batt, “Thin film processing using S-layer proteins: Biotemplated assembly of colloidal gold etch masks for fabrication of silicon nanopillar arrays”, Colloids Surf. B 57(2), 161–173 (2007). http://dx.doi.org/10.1016/ j.colsurfb.2007.01.015
  17. V. Gowrishankar, N. Miller, M. D. McGehee, M. J. Misner, D. Y. Ryu, T. P. Russell, E. Drockenmuller and C. J. Hawker, “Fabrication of densely packed, well-ordered, high-aspect-ratio silicon nanopillars over large areas using block copolymer lithography”, Thin Solid Films 513(1–2), 289–294 (2006). http://dx.doi.org/ 10.1016/j.tsf.2006.01.064
  18. L. Sainiemi, H. Keskinen, M. Aromaa, L. Luosujarvi, K. Grigoras, T. Kotiaho, J. M. Makela and S. Franssila, “Rapid fabrication of high aspect ratio silicon nanopillars for chemical analysis”, Nanotechnology 18(50), 505303 (2007). http://dx.doi.org/10.1088/ 0957-4484/18/50/505303
  19. K. K. Lee, D. R. Lim, L. C. Kimerling, J. Shin and F. Cerrina, “Fabrication of ultralow-loss Si/SiO2 waveguides by roughness reduction”, Optics Lett. 26(23), 1888–1890 (2001). http://dx.doi.org/10.1364/OL. 26.001888
  20. D. Csontos and H. Q. Xu, “Effects of boundary roughness on the conductance of quantum wires”, Appl. Phys. Lett. 77(15), 2364–2366 (2000). http://dx.doi.org/10.1063/1.1311606
  21. H. Cao, Z. Yu, J. Wang, J. O. Tegenfeldt, R. H. Austin, E. Chen, W. Wu and S. Y. Chou, “Fabrication of 10 nm enclosed nanofluidic channels”, Appl. Phys. Lett. 81(1), 174–176 (2002) http://dx.doi.org/10.1063/1.1489102
  22. Z. Yu and S. Y. Chou, “Triangular profile imprint molds in nanograting fabrication”, Nano Lett. 4(2), 341–344 (2004). http://dx.doi.org/10.1021/ nl034947l
  23. P. Mukherjee, M. Kang, T. H. Zurbuchen and L. J. Guo, “Fabrication of high aspect ratio Si nanogratings with smooth sidewalls for a deep UV-blocking particle filter”, J. Vac. Sci. Technol. B 25(6), 2645–2648 (2007). http://dx.doi.org/10.1116/1.2804612
  24. X. F. Gao and L. Jiang, “Biophysics: Water-repellent legs of water striders”, Nature 432 (7013), 36 (2004). http://dx.doi.org/10.1038/432036a
  25. Y. M. Zheng, X. F. Gao and L. Jiang, “Directional adhesion of superhydrophobic butterfly wings”, Soft Matter 3(2), 178–182 (2007). http://dx.doi.org/10.1039/b612667g
  26. W. J. P. Barnes, “Evolution, stable heterozygosity?”, Science 318(5848), 202–203 (2007). http://dx.doi.org/10.1126/science.1150197
  27. Y. M. Zheng, H. Bai, Z. B. Huang, X. Tian, F. Q. Nie, Y. Zhao, J. Zhai and L. Jiang, “Directional water collection on wetted spider silk”, Nature 463 (7281), 640–643 (2010). http://dx.doi.org/10.1038/ nature08729
  28. C. H. Choi and C. J. Kim, “Large slip of aqueous liquid flow over a nanoengineered superhydrophobic surface”, Phys. Rev. Lett. 96(6), 066001–066004 (2006). http://dx.doi.org/10.1103/PhysRevLett.96.066001
  29. P. Hoyer, M. Theuer, R. Beigang and E. B. Kley, “Terahertz emission from black silicon”, Appl. Phys. Lett. 93(9), 091106–091108 (2008). http://dx.doi.org/10.1063/1.2978096
Read More
Author biographies are not available.
Download this PDF file
PDF
Statistic
Read Counter : 6139 Download : 4676

Most read articles by the same author(s)