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Vol. 12 (2020)

N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence

https://doi.org/10.1007/s40820-020-0395-5
Neelakandan M. Santhosh
Jožef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia
Gregor Filipič
Jožef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia
Eva Kovacevic
GREMI CNRS-University of Orleans, 14 rue d’Issoudun, 45067 Orleans Cedex 2, France
Andrea Jagodar
GREMI CNRS-University of Orleans, 14 rue d’Issoudun, 45067 Orleans Cedex 2, France
Johannes Berndt
GREMI CNRS-University of Orleans, 14 rue d’Issoudun, 45067 Orleans Cedex 2, France
Thomas Strunskus
Institute for Materials Science, Christian Albrechts University Kiel, Kaiserstr, 2, 24143 Kiel, Germany
Hiroki Kondo
Department of Electrical Engineering and Computer Science, University of Nagoya, Furo‑cho Chikusa‑ku, Nagoya, Aichi 464‑8603, Japan
Masaru Hori
Department of Electrical Engineering and Computer Science, University of Nagoya, Furo‑cho Chikusa‑ku, Nagoya, Aichi 464‑8603, Japan
Elena Tatarova
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049 Lisbon, Portugal
Uroš Cvelbar
Jožef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia

Corresponding Author: Uroš Cvelbar

uros.cvelbar@ijs.si

Nano-Micro Letters, Vol. 12 (2020), Article Number: 53

Abstract

Incorporating nitrogen (N) atom in graphene is considered a key technique for tuning its electrical properties. However, this is still a great challenge, and it is unclear how to build N-graphene with desired nitrogen configurations. There is a lack of experimental evidence to explain the influence and mechanism of structural defects for nitrogen incorporation into graphene compared to the derived DFT theories. Herein, this gap is bridged through a systematic study of different nitrogen-containing gaseous plasma post-treatments on graphene nanowalls (CNWs) to produce N-CNWs with incorporated and substituted nitrogen. The structural and morphological analyses describe a remarkable difference in the plasma–surface interaction, nitrogen concentration and nitrogen incorporation mechanism in CNWs by using different nitrogen-containing plasma. Electrical conductivity measurements revealed that the conductivity of the N-graphene is strongly influenced by the position and concentration of C–N bonding configurations. These findings open up a new pathway for the synthesis of N-graphene using plasma post-treatment to control the concentration and configuration of incorporated nitrogen for application-specific properties.


Highlights:


1 Nitrogen was successfully incorporated in graphene nanowalls (CNWs) using cold gaseous plasma post-treatment and influence of nitrogen concentration and configuration in CNWs on electrical conductivity was demonstrated.
2 The mechanism of nitrogen incorporation was systematically studied using different characterisation techniques to make a bridge between established DFT theories.

Keywords

Graphene Graphene nanowalls Plasma post-treatment Nitrogen incorporation Raman spectroscopy Vacancy defects
Santhosh, Neelakandan M., Gregor Filipič, Eva Kovacevic, Andrea Jagodar, Johannes Berndt, Thomas Strunskus, Hiroki Kondo, Masaru Hori, Elena Tatarova, and Uroš Cvelbar. 2020. “N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence”. Nano-Micro Letters 12 (February):53. https://doi.org/10.1007/s40820-020-0395-5.
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