Issue

Vol. 3 No. 2 (2011)

Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement

https://doi.org/10.1007/BF03353663
Weimin Zhou
Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai 200237, China
Guoquan Min
Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai 200237, China
Jing Zhang
Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai 200237, China
Yanbo Liu
Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai 200237, China
Jinhe Wang
Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai 200237, China
Yanping Zhang
Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai 200237, China
Feng Sun
Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai 200237, China

Corresponding Author: Weimin Zhou

zhouweimin@snpc.org.cn

Nano-Micro Letters, Vol. 3 No. 2 (2011), Article Number: 135-140

Abstract

Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.

Keywords

Nanoimprint lithography Soft molecular scale Nanofabrication
Zhou, Weimin, Guoquan Min, Jing Zhang, Yanbo Liu, Jinhe Wang, Yanping Zhang, and Feng Sun. 2011. “Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement”. Nano-Micro Letters 3 (2):135-40. https://doi.org/10.1007/BF03353663.
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References
  1. S. Y. Chou, P. R. Krauss and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995). http://dx.doi.org/10.1063/1.114851
  2. S. Y. Chou, P. R. Krauss and P. J. Renstrom, Science 272, 85 (1996). http://dx.doi.org/10.1126/science.272.5258.85
  3. S. Y. Chou, P. R. Krauss and P. J. Renstrom, J. Vac. Sci. technol. B 14, 4129 (1996). http://dx.doi.org/10.1116/1.588605
  4. W. Wu, Appl. Phys. A 80, 1173 (2005). http://dx.doi.org/10.1007/s00339-004-3176-y
  5. H. Lee, S. H. Hong, K. Y. Yang and G. Y. Jung, Microelectro. Eng. 84, 573 (2007). http://dx.doi.org/10.1016/j.mee.2006.11.009
  6. S. H. Kim, K. D. Lee, M. K. Kwon and S. J. Park, Nanotechnology 18, 055306 (2007). http://dx.doi.org/10.1088/0957-4484/18/5/0553
  7. H. Lee, S. H. Hong, K. Y. Yang and G. Y. Jung, Microelectron. Eng. 84, 573 (2007). http://dx.doi.org/10.1016/j.mee.2006.11.009
  8. M. Colburn, S. Johnson and M. Stewart, Proc. SPIE 379, 36 (1999).
  9. F. Hua, Y. G. Sun, A. Gaur and M. A. Meitl, Nano Lett. 4, 2467 (2004). http://dx.doi.org/10.1021/nl048355u
  10. W. M. Zhou, G. Q. Min, Z. T. Song, et al. Nanotechnology 21, 205304 (2010). http://dx.doi.org/10.1088/0957-4484/21/20/205304
  11. Y. B. Liu, T. Zhang, G. X. Zhang, et al, Nanotechnology 20, 315304 (2009). http://dx.doi.org/10.1088/0957-4484/20/31/315304
  12. L. Jay. Guo, Adv. Mater. 19, 495 (2007).
  13. S. H. Ahn and L. J. Guo, ACS Nano 3, 2304 (2009). http://dx.doi.org/10.1021/nn9003633
  14. V. D. Mihailetchi, H. Xie, B. Boer, L. J. Anton Koster and P. W. M. Blom, Adv. Funct.Mater. 16, 699 (2006). http://dx.doi.org/10
  15. T. Erb, U. Zhokhavets, G. Gobsch, S. Raleva, B. Stuhn, P. Schilinsky, C. Waldauf and C. J. Brabec, Adv. Funct. Mater. 15, 1193 (2005). http://dx.doi.org/10.1002/adfm.200400521
  16. S. K. Park, Y. H. Kim, J. I. Han, D. G. Moon, W. K. Kim and M. G. Kwak, Synthetic Metals 139, 377 (2003). http://dx.doi.org/10.
  17. J. F. Chang, B. Sun, D. W. Breiby, M. M. Nielsen, T. I. Solling, M. Giles, I. McCulloch and H. Sirringhaus, Chem. Mater. 16, 4772 (2006). http://dx.doi.org/10.1021/cm049617w
  18. X. L. Li, Q. K. Wang, J. Zhang, et al, Microelectron. Eng. 86, 2015 (2008). http://dx.doi.org/10.1016/j.mee.2008.12.090
  19. W. M. Zhou, X. M. Niu, G. Q. Min and Z. T. Song, Microelectron. Eng. 86, 2375 (2009). http://dx.doi.org/10.1016/j.mee.2009.04.0
  20. W. M. Zhou, J. Zhang, X. L. Li and Y. B. Liu, Appl. Surf. Sci. 255, 8019 (2008). http://dx.doi.org/10.1016/j.apsusc.2009.05.006
  21. W. M. Zhou, J. Zhang, Y. B. Liu, X. L. Li, X. M. Niu, et al. Appl. Surf. Sci. 255, 2885 (2008). http://dx.doi.org/10.1016/j.aps
  22. Y. Hirai and Y. Tanaka, J. Photopolym. Sci. Technol. 15, 475 (2002). http://dx.doi.org/10.2494/photopolymer.15.475
  23. E. K. Kim, N. A. Stacey, B. J. Smith, M. D. Dickey, S. C. Johnson and B. C. Trinque, J. Vac. Sci. Technol. B 22, 131 (2004). http://dx.doi.org/10.1116/1.1635849
  24. X. Cheng, L. J. Guo and P. F. Fu, Adv. Mater. 17, 1419 (2005). http://dx.doi.org/10.1002/adma.200401192
  25. B. K. Long, B. Keith Keitz and C. Grant Willson, J. Mater. Chem. 17, 3575 (2007). http://dx.doi.org/10.1039/b705388f
  26. L. Chen, X. G. Deng, J. Wang, et al, J. Vac. Sci. Technol. B 23, 2933 (2005). http://dx.doi.org/10.1116/1.2130352
  27. H. S. Park, H. H. Shin and M. Y. Man, IEEE Trans. Semicond. Manu. 20, 13 (2007). http://dx.doi.org/10.1109/TSM.2006.890315
  28. N. H. Li, W. Wu and S. Y. Stephon, Nano Lett. 6, 2626 (2006). http://dx.doi.org/10.1021/nl0603395
  29. P. Maury, M. Péter, X. Y. Ling and N. David, Nanotechnology 18, 044007 (2007). http://dx.doi.org/10.1088/0957-4484/18/4/044007
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