Effect of Gold Nanoparticles on the Photocatalytic and Photoelectrochemical Performance of Au Modified BiVO4
Corresponding Author: Mingce Long
Nano-Micro Letters,
Vol. 3 No. 3 (2011), Article Number: 171-177
Abstract
An efficient visible light driven photocatalyst, gold nanoparticles (NPs) modified BiVO4 (Au/BiVO4), has been synthesized by deposition-precipitation with urea method. Au/BiVO4 exhibits enhanced photocatalytic activity for phenol degradation under λ>400 nm irradiation but negligible activity under λ>535 nm, indicating that the surface plasmon resonance (SPR) effect is too weak for organic photodegradation. According to the photoelectrochemical results of the porous powder electrodes of BiVO4 and Au/BiVO4, the SPR effect of Au NPs has been assessed. The role of Au NPs as electron sinks or sources, which is controllable by incident photon energy and applied potentials, has been discussed.
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- M. C. Long, J. Cai, W. M. Cai, H. Chen and X. Chai, Prog. Chem. 18, 1065(2006).
- R. V. D. Krol, Y. Liang and J. Schoonman, J. Mater. Chem. 18, 2311 (2008). http://dx.doi.org/10.1039/b718969a
- S. S. Rayalu and N. K. Labhsetwar, Int. J. Nanotechnol. 7, 967 (2010). http://dx.doi.org/10.1504/IJNT.2010.034702
- M. C. Long, W. M. Cai, J. Cai, B. X. Zhou, X. Y. Chai and Y. H. Wu, J. Phys. Chem. B 110, 20211 (2006). http://dx.doi.org/10.1021/jp063441z
- J. Q. Yu and A. Kudo, Adv. Funct. Mater. 16, 2163 (2006). http://dx.doi.org/10.1002/adfm.200500799
- S. Kohtani, S. Makino, A. Kudo, K. Tokumura, Y. Ishigaki, T. Matsunaga, O. Nikaido, K. Hayakawa and R. Nakagaki, Chem. Lett. 31, 660 (2002). http://dx.doi.org/10.1246/cl.2002.660
- H. X. Li, Z. F. Bian, J. Zhu, Y. N. Huo, H. Li and Y. F. Lu, J. Am. Chem. Soc. 129, 4538 (2007). http://dx.doi.org/10.1021/ja069113u
- A. P. Zhang and J. Z. Zhang, J. Alloy Compd. 491, 631 (2010).
- Y. Xie, K. Ding, Z. Liu, R. Tao, Z. Sun, H. Zhang and G. An, J. Am. Chem. Soc. 131, 6648(2009). http://dx.doi.org/10.1021/ja900447d
- G. H. Li and K. A. Gray, Chem. Phys. 339, 173 (2007). http://dx.doi.org/10.1016/j.chemphys.2007.05.023
- E. Ozbay, Science 311, 189 (2006). http://dx.doi.org/10.1126/science.1114849
- Y. Tian and T. Tatsuma, Chem. Commun. 1810 (2004). http://dx.doi.org/10.1039/b405061d
- Y. Tian and T. Tatsuma, J. Am. Chem. Soc. 127, 7632(2005). http://dx.doi.org/10.1021/ja042192u
- H. Y. Zhu, X. Chen, Z. F. Zheng, X. B. Ke, E. Jaatinen, J. C. Zhao, C. Guo, T. F. Xie and D. J. Wang, Chem. Commun. 7524 (2009). http://dx.doi.org/10.1039/b917052a
- A. Furube, L. Du, K. Hara, R. Katoh and M. Tachiya, J. Am. Chem. Soc. 129, 14852 (2007). http://dx.doi.org/10.1021/ja076134v
- X. Chen, H. Y. Zhu, J. C. Zhao, Z. F. Zheng and X. P. Gao, Angew. Chem. Int. Ed. 47, 5353 (2008). http://dx.doi.org/10.1002/anie.200800602
- E. Kowalska, R. Abe and B. Ohtani, Chem. Commun. 241 (2009). http://dx.doi.org/10.1039/b815679d
- S. Naya, A. Inoue and H. Tada, J. Am. Chem. Soc. 132, 6292 (2010). http://dx.doi.org/10.1021/ja101711j
- P. Wang, B. Huang, X. Qin, X. Zhang, Y. Dai, J. Wei and M. H. Whangbo, Angew. Chem. Int. Ed. 47, 7931(2008). http://dx.doi.org/10.1002/anie.200802483
- C. Hu, T. Peng, X. Hu, Y. Nie, X. Zhou, J. Qu and H. He, J. Am. Chem. Soc. 132, 857(2010). http://dx.doi.org/10.1021/ja907792d
- V. Schwartz, D. R. Mullins, W. Yan, B. Chen, S. Dai and S. H. Overbury, J. Phys. Chem. B 108, 15782 (2004). http://dx.doi.org/10.1021/jp048076v
- P. Chatchai, S. Y. Kishioka, Y. Murakami, A. Y. Nosaka and Y. Nosaka, Electrochim. Acta 55, 592 (2010). http://dx.doi.org/10.1016/j.electacta.2009.09.032
- R. Zanella, S. Giorgio, C. R. Henry and C. Louis, J. Phys. Chem. B 106, 7634 (2002). http://dx.doi.org/10.1021/jp0144810
- S. Link and M. A. El-Sayed, J. Phys. Chem. B 103, 4212 (1999). http://dx.doi.org/10.1021/jp984796o
- A. Galembeck and O. L. Alves, Thin Solid Films 365, 90 (2000). http://dx.doi.org/10.1016/S0040-6090(99)01079-2
- K. Teramura, K. Maeda, T. Saito, T. Takata, N. Saito, Y. Inoue and K. Domen, J. Phys. Chem. B 109, 21915 (2005). http://dx.doi.org/10.1021/jp054313y
- A. Shiga, A. Tsujiko, T. Ide, S. Yae and Y. Nakato, J. Phys. Chem. B 102, 6049 (1998). http://dx.doi.org/10.1021/jp981280w
- M. Long, W. Cai and H. Kisch, J. Phys. Chem. C 112, 548 (2008). http://dx.doi.org/10.1021/jp075605x
- R. Beranek and H. Kisch, Electrochem. Commun. 9, 761 (2007). http://dx.doi.org/10.1016/j.elecom.2006.11.011
- L. M. Peter, Chem. Rev. 90, 753 (1990). http://dx.doi.org/10.1021/cr00103a005
- K. Yamada, K. Miyajima and F. Mafune, J. Phys. Chem. C 111, 11246 (2007). http://dx.doi.org/10.1021/jp0730747
- B. Balamurugan and T. Maruyama, Appl. Phys. Lett. 87, 143105 (2005). http://dx.doi.org/10.1063/1.2077834
- Y. Chen, J. C. Crittenden, S. Hackney, L. Sutter and D. W. Hand, Environ. Sci. Techol. 39, 1201(2005). http://dx.doi.org/10.1021/es049252g
- M. C. Long, R. Beranek, W. M. Cai and H. Kisch, Electrochim. Acta 53, 4621 (2008). http://dx.doi.org/10.1016/j.electacta.2008.01.077
References
M. C. Long, J. Cai, W. M. Cai, H. Chen and X. Chai, Prog. Chem. 18, 1065(2006).
R. V. D. Krol, Y. Liang and J. Schoonman, J. Mater. Chem. 18, 2311 (2008). http://dx.doi.org/10.1039/b718969a
S. S. Rayalu and N. K. Labhsetwar, Int. J. Nanotechnol. 7, 967 (2010). http://dx.doi.org/10.1504/IJNT.2010.034702
M. C. Long, W. M. Cai, J. Cai, B. X. Zhou, X. Y. Chai and Y. H. Wu, J. Phys. Chem. B 110, 20211 (2006). http://dx.doi.org/10.1021/jp063441z
J. Q. Yu and A. Kudo, Adv. Funct. Mater. 16, 2163 (2006). http://dx.doi.org/10.1002/adfm.200500799
S. Kohtani, S. Makino, A. Kudo, K. Tokumura, Y. Ishigaki, T. Matsunaga, O. Nikaido, K. Hayakawa and R. Nakagaki, Chem. Lett. 31, 660 (2002). http://dx.doi.org/10.1246/cl.2002.660
H. X. Li, Z. F. Bian, J. Zhu, Y. N. Huo, H. Li and Y. F. Lu, J. Am. Chem. Soc. 129, 4538 (2007). http://dx.doi.org/10.1021/ja069113u
A. P. Zhang and J. Z. Zhang, J. Alloy Compd. 491, 631 (2010).
Y. Xie, K. Ding, Z. Liu, R. Tao, Z. Sun, H. Zhang and G. An, J. Am. Chem. Soc. 131, 6648(2009). http://dx.doi.org/10.1021/ja900447d
G. H. Li and K. A. Gray, Chem. Phys. 339, 173 (2007). http://dx.doi.org/10.1016/j.chemphys.2007.05.023
E. Ozbay, Science 311, 189 (2006). http://dx.doi.org/10.1126/science.1114849
Y. Tian and T. Tatsuma, Chem. Commun. 1810 (2004). http://dx.doi.org/10.1039/b405061d
Y. Tian and T. Tatsuma, J. Am. Chem. Soc. 127, 7632(2005). http://dx.doi.org/10.1021/ja042192u
H. Y. Zhu, X. Chen, Z. F. Zheng, X. B. Ke, E. Jaatinen, J. C. Zhao, C. Guo, T. F. Xie and D. J. Wang, Chem. Commun. 7524 (2009). http://dx.doi.org/10.1039/b917052a
A. Furube, L. Du, K. Hara, R. Katoh and M. Tachiya, J. Am. Chem. Soc. 129, 14852 (2007). http://dx.doi.org/10.1021/ja076134v
X. Chen, H. Y. Zhu, J. C. Zhao, Z. F. Zheng and X. P. Gao, Angew. Chem. Int. Ed. 47, 5353 (2008). http://dx.doi.org/10.1002/anie.200800602
E. Kowalska, R. Abe and B. Ohtani, Chem. Commun. 241 (2009). http://dx.doi.org/10.1039/b815679d
S. Naya, A. Inoue and H. Tada, J. Am. Chem. Soc. 132, 6292 (2010). http://dx.doi.org/10.1021/ja101711j
P. Wang, B. Huang, X. Qin, X. Zhang, Y. Dai, J. Wei and M. H. Whangbo, Angew. Chem. Int. Ed. 47, 7931(2008). http://dx.doi.org/10.1002/anie.200802483
C. Hu, T. Peng, X. Hu, Y. Nie, X. Zhou, J. Qu and H. He, J. Am. Chem. Soc. 132, 857(2010). http://dx.doi.org/10.1021/ja907792d
V. Schwartz, D. R. Mullins, W. Yan, B. Chen, S. Dai and S. H. Overbury, J. Phys. Chem. B 108, 15782 (2004). http://dx.doi.org/10.1021/jp048076v
P. Chatchai, S. Y. Kishioka, Y. Murakami, A. Y. Nosaka and Y. Nosaka, Electrochim. Acta 55, 592 (2010). http://dx.doi.org/10.1016/j.electacta.2009.09.032
R. Zanella, S. Giorgio, C. R. Henry and C. Louis, J. Phys. Chem. B 106, 7634 (2002). http://dx.doi.org/10.1021/jp0144810
S. Link and M. A. El-Sayed, J. Phys. Chem. B 103, 4212 (1999). http://dx.doi.org/10.1021/jp984796o
A. Galembeck and O. L. Alves, Thin Solid Films 365, 90 (2000). http://dx.doi.org/10.1016/S0040-6090(99)01079-2
K. Teramura, K. Maeda, T. Saito, T. Takata, N. Saito, Y. Inoue and K. Domen, J. Phys. Chem. B 109, 21915 (2005). http://dx.doi.org/10.1021/jp054313y
A. Shiga, A. Tsujiko, T. Ide, S. Yae and Y. Nakato, J. Phys. Chem. B 102, 6049 (1998). http://dx.doi.org/10.1021/jp981280w
M. Long, W. Cai and H. Kisch, J. Phys. Chem. C 112, 548 (2008). http://dx.doi.org/10.1021/jp075605x
R. Beranek and H. Kisch, Electrochem. Commun. 9, 761 (2007). http://dx.doi.org/10.1016/j.elecom.2006.11.011
L. M. Peter, Chem. Rev. 90, 753 (1990). http://dx.doi.org/10.1021/cr00103a005
K. Yamada, K. Miyajima and F. Mafune, J. Phys. Chem. C 111, 11246 (2007). http://dx.doi.org/10.1021/jp0730747
B. Balamurugan and T. Maruyama, Appl. Phys. Lett. 87, 143105 (2005). http://dx.doi.org/10.1063/1.2077834
Y. Chen, J. C. Crittenden, S. Hackney, L. Sutter and D. W. Hand, Environ. Sci. Techol. 39, 1201(2005). http://dx.doi.org/10.1021/es049252g
M. C. Long, R. Beranek, W. M. Cai and H. Kisch, Electrochim. Acta 53, 4621 (2008). http://dx.doi.org/10.1016/j.electacta.2008.01.077