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Vol. 4 No. 1 (2012)

High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering

https://doi.org/10.1007/BF03353690
Chengzhang Han
Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China
Da Chen
Department of Applied Physics, College of Science, Shandong University of Science and Technology, 579 Qianwangang Road Economic & Technical Development Zone, Qingdao Shandong Province, 266510, China
Yaozhong Zhang
Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China
Dong Xu
Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China
Yijian Liu
Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China
Eric Siu-Wai Kong
Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China
Yafei Zhang
Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China

Corresponding Author: Yafei Zhang

yfzhang@sjtu.edu.cn

Nano-Micro Letters, Vol. 4 No. 1 (2012), Article Number: 40-44

Abstract

Columnar nanocrystalline aluminum nitride (cnc-AlN) thin films with (002) orientation and uniform texture have been deposited successfully on large silicon wafers by RF reactive magnetron sputtering. At the optimum sputtering parameters, the deposited cnc-AlN thin films show a c-axis preferred orientation with a crystallite size of about 28 nm and surface roughness (RMS) of about 1.29 nm. The cnc-AlN thin films were well transparent with an optical band gap about 4.8 eV, and the residual compressive stress and the defect density in the film have been revealed by Ramon spectroscopy. Moreover, piezoelectric performances of the cnc-AlN thin films executed effectively in a film bulk acoustic resonator structure.

Keywords

Columnar film Aluminum nitride Piezoelectric effect RF sputtering Optical property
Han, Chengzhang, Da Chen, Yaozhong Zhang, Dong Xu, Yijian Liu, Eric Siu-Wai Kong, and Yafei Zhang. 2012. “High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering”. Nano-Micro Letters 4 (1):40-44. https://doi.org/10.1007/BF03353690.
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