High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering
Corresponding Author: Yafei Zhang
Nano-Micro Letters,
Vol. 4 No. 1 (2012), Article Number: 40-44
Abstract
Columnar nanocrystalline aluminum nitride (cnc-AlN) thin films with (002) orientation and uniform texture have been deposited successfully on large silicon wafers by RF reactive magnetron sputtering. At the optimum sputtering parameters, the deposited cnc-AlN thin films show a c-axis preferred orientation with a crystallite size of about 28 nm and surface roughness (RMS) of about 1.29 nm. The cnc-AlN thin films were well transparent with an optical band gap about 4.8 eV, and the residual compressive stress and the defect density in the film have been revealed by Ramon spectroscopy. Moreover, piezoelectric performances of the cnc-AlN thin films executed effectively in a film bulk acoustic resonator structure.
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- A. Khanna and D. G. Bhat, J. Vac. Sci. Technol. A 25, 557 (2007). http://dx.doi.org/10.1116/1.2730513
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- M. Clement, E. Iborra, J. Sangrador, et al., J. Appl. Phys. 94, 1495 (2003). http://dx.doi.org/10.1063/1.1587267
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References
A. Khanna and D. G. Bhat, J. Vac. Sci. Technol. A 25, 557 (2007). http://dx.doi.org/10.1116/1.2730513
M. Clement, E. Iborra, J. Sangrador, A. Sanz-Hervas, L. Vergara and M. Aguilar, J. Appl. Phys. 94, 1495 (2003). http://dx.doi.org/10.1063/1.1587267
T. P. Drusedau and J. Blasing, Thin Solid Films 377, 27 (2000). http://dx.doi.org/10.1016/S0040-6090(00)01380-8
M. Clement, E. Iborra, J. Sangrador, et al., J. Appl. Phys. 94, 1495 (2003). http://dx.doi.org/10.1063/1.1587267
X. H. Xu, H. S. Wu, C. J. Zhang, et al., Thin Solid Films 388, 62 (2001). http://dx.doi.org/10.1016/S0040-6090(00)01914-3
S. S. Lin, J. L. Huang and P. Sajgalik, Surf. Coatings Technol. 190, 39 (2005). http://dx.doi.org/10.1016/j.surfcoat.2004.03.022
S. Chon, J. Cryst. Growth 326, 179 (2011). http://dx.doi.org/10.1016/j.jcrysgro.2011.01.092
E. Valcheva, S. Dimitrov, D. Manova, et al., Surf. Coat. Tech. 202, 2319 (2008). http://dx.doi.org/10.1016/j.surfcoat.2007.08.051
F. Yakuphanoglu, M. Sekerci and O. F. Ozturk, Opt. Commun. 239, 275 (2004). http://dx.doi.org/10.1016/j.optcom.2004.05.038
B. Subramanian, V. Swaminathan and M. Jayachandran, Current Appl. Phys. 11, 43 (2011). http://dx.doi.org/10.1016/j.cap.2010.06.016
T. Prokofyeva, M. Seon, J. Vanbuskirk, M. Holtz, S. A. Nikishin, N. N. Faleev, H. Temkin, and S. Zollner, Phys. Rev. B 63, 125313 (2001). http://dx.doi.org/10.1103/PhysRevB.63.125313
D. T. Phan, G. S. Chung, Appl. Surf. Sci. 257, 8696 (2011). http://dx.doi.org/10.1016/j.apsusc.2011.05.050
Q. X. Su, P. Kirby, E. Komuro, M. Imura, Q. Zhang and R. Whatmore, IEEE Trans. Microwave Theory Tech 49, 769 (2001). http://dx.doi.org/10.1109/22.915462